Photomask
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A photomask is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits
A photomask. This photomask has 20 copies, also called layers, of the same circuit pattern or design.
Pellicle mounting machine MLI
Rubylith
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Rubylith is a brand of masking film, invented and trademarked by the Ulano Corporation. Today the brand has become genericized to the point that it has become synonymous with all coloured masking film
Photomask
…known as manhattan geometry. These photomasks require special equipment to manufacture. For IC production in the 1960s and early 1970s, an opaque rubylith film laminated onto a transparent mylar sheet was used. The design of one layer was cut into the rubylith, initially by hand on an illuminated drafting…
Founders of Intel inc. (Andy Grove, Robert Noyce and Gordon Moore) standing next to a Rubylith with a cutout for the Intel 8080A microprocessor, 1978.
A technician makes small-detail corrections of a circuit image on a large Rubylith. The image will be copied, miniaturized, and utilized in making computer chips.
Rubylith tracing of an integrated circuit.