The entire wiki reimagined as a visual magazine with video discovery · Watch your interests come alive
The entire wiki reimagined as a visual magazine with video discovery · Watch your interests come alive
A semiconductor device manufacturing facility at HP Labs
A semiconductor device manufacturing facility at HP Labs
Intel facilities in Chandler, Arizona
Intel facilities in Chandler, Arizona
Semiconductor photomask or reticle
Semiconductor photomask or reticle
4 fach NAND C10
4 fach NAND C10
MOSFET
Two power MOSFETs in D2PAK surface-mount packages. Operating as switches, each of these components can sustain a blocking voltage of 120 V in the off
Two power MOSFETs in D2PAK surface-mount packages. Operating as switches, each of these components can sustain a blocking voltage of 120 V in the off state, and can conduct a con­ti­nuous current of 30 A in the on state, dissipating up to about 100 W and controlling a load of over 2000 W. A matchstick is pictured for scale.
Photomicrograph of two metal-gate MOSFETs in a test pattern. Probe pads for two gates and three source/drain nodes are labeled.
Photomicrograph of two metal-gate MOSFETs in a test pattern. Probe pads for two gates and three source/drain nodes are labeled.