A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry.
A printed circuit board-4276
A 12-inch silicon wafer can carry hundreds or thousands of integrated circuit dice
A positive photoresist example, whose solubility would change by the photogenerated acid. The acid deprotects the tert-butoxycarbonyl (t-BOC), inducing the resist from alkali-insoluble to alkali-soluble. This was the first chemically amplified resist used in the semiconductor industry, which was invented by Ito, Willson, and Frechet in 1982.
A crosslinking of a polyisoprene rubber by a photoreactive biazide as negative photoresist
Photolithography is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer.
The wafer track portion of an aligner that uses 365 nm ultraviolet light