Photoresist
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A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics
A printed circuit board-4276
A 12-inch silicon wafer can carry hundreds or thousands of integrated circuit dies.
A positive photoresist example, whose solubility would change by the photogenerated acid. The acid deprotects the tert-butoxycarbonyl (t-BOC), inducing the resist from alkali-insoluble to alkali-soluble. This was the first chemically amplified resist used in the semiconductor industry, which was invented by Ito, Willson, and Frechet in 1982.
A crosslinking of a polyisoprene rubber by a photoreactive biazide as negative photoresist
Aligner (semiconductor)
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An aligner, or mask aligner, is a system that produces integrated circuits using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the m
A SÜSS MicroTec MA6 mask aligner